FURUYA METAL provides made-to-order sputtering service for Magnetic Recording, Touch Panels, Non-volatile semiconductor memory, electric devices and electric components. We are able to provide various kinds of PGM targets. FURUYA commits to contributing to your efficient R&D by speeding up and reducing the costs of development.
We can do film formation using 2- and 3-dimensional co-sputtering. Also, since our cathodes are small at φ2 inches, we can perform materials searches at low initial cost because this size is optimal for materials exploration.
Since we can form films on everything from minute substrates to φ8 inch wafers, we can get new materials onto device development lines and evaluate these materials in-house.
We can form films under high vacuum conditions because we use load lock-type apparatus.
We can supply uniform films through the use of φ300mm targets.
We can form films on large substrates such as φ300Si wafers and glass for FPD.
Powder Sputtering is a technology which coats metals, ceramics, and various other materials at a nano level using a fine powder in a dry environment.
We provide patterning processing using metal masks and resist patterns together with film formation processing.
According to our customer needs, FURUYA METAL also conduct thin film analysis.