Chemical Products Precious Metal Compounds and High-Purity Powders
Furuya Metal manufactures high-purity powders and compounds by re-refining iridium and ruthenium sourced from mines according to application requirements.
Ir (Iridium)
Iridium compounds derived from platinum group metals are known for stable performance even under high-temperature and highly corrosive environments. They are used in a wide range of applications, including coating materials for electrolytic electrodes, phosphorescent materials for OLEDs, and environmental catalysts and electrocatalysts.
Furuya Metal offers high-purity, high-quality iridium compounds tailored to specific applications and process requirements.
| Name | Chemical formula | CAS No. | SDS (Safety Data Sheet) |
|
|---|---|---|---|---|
| Hydrogen hexachloroiridate(IV) hydrate | H2IrCl6・nH2O | 110802-84-1 | - | |
| Hydrogen hexachloroiridate(IV) (hydrochloric acid solution) | H2IrCl6 HCl soln. |
Hydrogen hexachloroiridate(IV)：16941-92-7 Hydrochloric Acid：7647-01-0 |
【HCl concentration：10〜20%】 | |
|
Iridium(III) chloride hydrate [trivalent product] |
IrCl3・nH2O | 14996-61-3 | - | |
|
Trihydrogen hexachloroiridate(III) (hydrochloric acid solution) [trivalent product] |
H3IrCl6 HCl soln. |
Iridium(III) chloride hydrate：14996-61-3 Hydrochloric acid：7647-01-0 |
【HCl concentration：10〜15%】 | |
| Iridium(IV) nitrate (nitric acid solution) | Ir(NO3)4 HNO3 soln. |
Iridium(IV) nitrate：— Nitric acid：7697-37-2 |
【HNO₃ concentration: 10% or higher】 | |
| Ammonium hexachloroiridate(IV) | (NH4)2IrCl6 | 16940-92-4 | - | |
| Iridium(IV) oxide | IrO2 | 12030-49-8 | - | |
| Hexaammineiridium(III) hydroxide solution | [Ir(NH3)6](OH)3 soln. | - | - | |
| IrRu binary oxide | IrRuOx | 106389-82-6 | - | |
* Please contact us if you require products with concentrations outside the ranges specified in the SDS.
Ru (Ruthenium)
Ruthenium compounds derived from platinum group metals are known for their excellent catalytic activity, electrochemical properties, and corrosion resistance. They are used in applications such as coating materials for electrolytic electrodes, catalysts for organic synthesis, and precursor materials for semiconductors and electronic components.
Furuya Metal offers high-purity, high-quality ruthenium compounds tailored to specific applications and process requirements, with one of the world’s largest production capacities.
| Name | Chemical formula | CAS No. | SDS (Safety Data Sheet) |
|
|---|---|---|---|---|
| Ruthenium(III) chloride hydrate | RuCl3・nH2O | 14898-67-0 | - | |
| Ruthenium(III) chloride | RuCl3 HCl soln. |
Ruthenium(III) chloride：14898-67-0 Hydrochloric acid：7647-01-0 |
【HCl concentration：10〜30%】 【HCl concentration: Less than 10%】 |
PDF |
|
Ruthenium(III) chloride hydrate [trivalent product] |
RuCl3・nH2O | 14898-67-0 | - | |
|
Ruthenium(III) chloride (hydrochloric acid solution) [trivalent product] |
RuCl3 HCl soln. |
Ruthenium(III) chloride hydrate：14898-67-0 Hydrochloric acid：7647-01-0 |
【HCl concentration:：10〜30%】 【HCl concentration: Less than 10%】 |
PDF |
| Ruthenium(IV) oxide | RuO2 | 12036-10-1 | - | |
| Ruthenium(IV) oxide hydrate | RuO2・nH2O | 32740-79-7 | - | - |
| Sodium ruthenate(VI) solution | Na2RuO4 soln. |
Sodium ruthenate(VI)：17001-79-5 Sodium hydroxide：1310-73-2 |
【NaOH5〜25%】 | |
| Ruthenium(III) nitrate (nitric acid solution) | Ru(NO3)3 HNO3 soln. |
Ruthenium(III) nitrate：15825-24-8 Nitric acid：7697-37-2 |
【HNO₃ concentration: Less than 10%】 | |
| Ruthenium(III) nitrosyl nitrate (nitric acid solution) | Ru(NO)(NO3)3 HNO3 soln. | 34513-98-9 | 【HNO₃ concentration: Less than 10%】 | |
* Please contact us if you require products with concentrations outside the ranges specified in the SDS.
High-purity powders
Furuya Metal provides high-purity powders with purities of up to 4N5 for iridium and 5N for ruthenium. Compared with commercially available powders, these high-purity materials are used in a wide range of cutting-edge applications.
Leveraging our expertise in precious metal products for the semiconductor and electronic materials industries, where exceptionally high quality standards are required, we minimize impurities to the utmost level, stabilize composition, and achieve uniform particle size distribution.
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