Thin Film Products Contract Thin Film Deposition Services
Furuya Metal provides contract thin film deposition services using its in-house sputtering systems. We support a wide range of requirements, from research and development to production feasibility studies.
With the capability to accommodate up to four targets simultaneously, we can form multilayer films and alloy films using materials tailored to customer requirements.
Leveraging extensive experience and expertise in depositing precious metals and a wide variety of other materials, we provide comprehensive support ranging from process optimization to thin film property evaluation, helping accelerate customer device development.
We also offer a lineup of precious metal deposition materials that are not widely available from other suppliers.
Overview of the sputtering system for planar film deposition
Depending on the system, reverse sputtering and the deposition of multilayer or alloy films using multiple target materials are available.
| Name |  |
 |
 |
 |
 |
|---|---|---|---|---|---|
| 4 cathode machine | 3 cathode machine | LTS machine | High vacuum machine | Inter back machine | |
| Substrate temperature | 〜400℃ | 〜600℃ | 〜500℃ | 〜580℃ | 〜250℃ |
| Substrate size | φ6inch（150mm） | φ4inch（100mm） | φ8inch（200mm） | φ8inch（200mm） | 370mm×470mm |
| Standard base pressure | 5.0×10-4Pa | 5.0×10-4Pa | 5.0×10-4Pa | 2.0×10-5Pa | 5.0×10-5Pa |
| Ultimate base pressure | 5.0×10-5Pa | 5.0×10-5Pa | 7.0×10-5Pa | 8.0×10-6Pa | 5.0×10-5Pa |
| Power supply | RF×4 | RF×3 | RF×2 DC×1 |
RF×1 DC×2 |
DC×2 |
| Maximum power | 200W | 200W | RF 300W DC 250W |
RF 2000W DC 2000W |
DC 1500W |
| Number of cathodes | 4 cathodes Multi-cathode sputtering available |
3 cathodes Multi-cathode sputtering available |
3 cathodes Reverse sputtering available |
2 cathodes Multi-cathode sputtering not available |
4 cathodes Multi-cathode sputtering not available |
| Process gas | Ar、O2、N2 | Ar、O2、N2 | Ar、O2、N2 | Ar、O2、N2 | Ar、O2、N2 |
Example target materials available
| Precious metals | Ir、Ru、Pt、Rh、Pd、Au、Ag、APC series |
|---|---|
| Metals | AI、Ti、Cu、Co、Nb、Re、Fe、Cr、Ni、In、Si、Ta、Zr、Mo、and others |
| Oxides | Al203、TiO2、SiO2、ITO、IZO、and others |
- * Target materials not currently available in our inventory can also be deposited using customer-supplied materials or materials procured by Furuya Metal.
- * Oxide and nitride films can be deposited using reactive sputtering.
- * Depending on demand and usage, some of the target materials listed above may be temporarily out of stock.
Contact Us
For inquiries or consultations regarding our products and technologies, please feel free to contact us.
A representative will get back to you shortly.
Related products by industry
